Spacer Engineered FinFET Architectures: High-Performance Digital Circuit Applications
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- Synopsis
- This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
- Copyright:
- 2017
Book Details
- Book Quality:
- Publisher Quality
- Book Size:
- 138 Pages
- ISBN-13:
- 9781351751032
- Related ISBNs:
- 9781315191089, 9780367573553, 9781498783590
- Publisher:
- CRC Press
- Date of Addition:
- 10/01/23
- Copyrighted By:
- Taylor & Francis Group, LLC
- Adult content:
- No
- Language:
- English
- Has Image Descriptions:
- No
- Categories:
- Nonfiction, Technology
- Submitted By:
- Bookshare Staff
- Usage Restrictions:
- This is a copyrighted book.
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